Thermal oxide coated Si wafers by dry or wet oxidation, single/double side coatings available
|Product:||Si wafer with SiO2 (thermal oxide) layer|
|Production method:||High temperature furnace oxidation of Si wafer|
|Appearance:||Color changes from silver gray to purple/blue after oxidation.|
|Si base wafer:||Oxide layer can be produced on Si wafer of any grade (prime / dummy / solar / etc)|
• Oxide layer coated on double sides
Oxidation in air naturally produced oxide layer on both sides of the wafers.
• Oxide layer coated on single side
SiO2 layer on back side (usually non-polished side) can be removed upon request.
|Oxide layer thickness:||10 nm up to 10 um|
• As-cut wafers without polishing
• Single side epi-polished
• Double side epi-polished