Si Wafer with Si3N4 Layer

Insulating Si3N4 layer coated on Si wafer by LPCVD, single/double coatings available

Product:Si wafer with Si3N4 (silicon nitride) layer
Production method:Low pressure chemical vapor deposition (LPCVD)
Si base wafer:Si3N4 layer can be deposited on Si wafer of any grade (prime / dummy / solar / etc)
SiO2 coating:

• Si3N4 layer coated on double sides

  The deposition method (LPCVD) naturally deposit Si3N4 layer on both sides.

• Si3N4 layer coated on single side

  Si3N4 layer on back side (usually non-polished side) can be removed upon request.

Oxide layer thickness:Usually several hundreds of nanometer

• As-cut wafers without polishing

• Single side epi-polished

• Double side epi-polished